Instrument name |
Atomic Layer Deposition System (ALD) |
Model |
Savannah-100 |
Manufacturer |
Cambridge Nano Tech |
Specifications |
1.Precursor Source: There are four kinds of precursor sourcs, three of them could be heated, but the fourth one could not be heated. 2.Sample Size: Up to 4” 3.Deposition Temperature: The maximum temperature is～300℃ 4. Carrier Gas: N2, MFC control is 10-1000 sccm. |
Function and applications |
Atomic Layer Deposition System (ALD) is a self-limiting process capable of precise monolayer growth, which is mainly used for the dielectric layer thin film deposition in the field of nano field-effect transistor (FET) and organic light emitting diode (OLED). |
Accessories |
Mechanical Pump |
Contacts: Wenchang Zhu |
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Contact number:65881259 |
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E-mail: wczhu@suda.edu.cn |
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Editor: Wenchang Zhu