System Component |
SEM and Electron beam exposure pattern generator |
Manufacturer of SEM |
FEI company（USA） |
Model of SEM |
Quanta 200FEG |
Specifications of SEM |
1.0 nm at 30 KV (SE) in high vacuum 3.5 nm at 3 KV (SE) in high Vacuum Accelerating voltage: 200V～30KV |
Manufacturer ofElectron-beam exposure pattern generator |
Raith (DE) |
Model ofElectron-beam exposure pattern generator |
ELPHY Quantum |
Specifications ofElectron-beam exposure pattern generator |
1. Scanning frequency: 6 MHz 2.Dwell time: 167 ns 3.Whitefield alignment: Hardware correction |
Application and uses |
The main application of the system is for SEM lithography, The system can be applied to the research of microelectronics, micromechanics, and micro/nano optics. |
Contact |
Yujie Han |
Tel. |
65880320 |
yjhan@suda.edu.cn |
Editor: Wenchang Zhu