叶超，男，1965年5月生。1986年毕业于www.优德88.cpm 物理系，2006年获得www.优德88.cpm 凝聚态物理博士学位，现为物理国家级实验教学示范中心（www.优德88.cpm ）副主任， “基础物理（实验）教学团队”国家级教学团队核心成员，www.优德88.cpm 低温等离子体创新研究团队核心成员。

电子邮件：cye@suda.edu.cn

研究方向：

1、多频等离子体物理、技术、诊断及其在先进薄膜材料加工中的应用。

2、超低k微纳电子薄膜材料物理及相关技术。

代表作：

1、Chao Ye, Yanhong Deng, Shuibing Ge and Zhaoyuan Ning, Reptation aggregation of liquid silicon oils modified by Ar plasmas,Plasma Process. Polym.10(9), 761- 766 (2013)

2、Chao Ye, Haijie He, Fupei Huang, Yi Liu and Xiangying Wang,Control of ions energy distribution in dual-frequencymagnetronsputtering discharges,Phys. Plasma21(4),043509(2014)

3、Fupei Huang, Chao Ye, Haijie He, Yi Liu, Xiangying Wang and Zhaoyuan Ning, Effect of driving frequency on plasma property in radio frequency and very high frequencymagnetron sputtering discharges,Plasma Sources Sci. Technol.23(1), 015003(2014)

4、Haijie He, Chao Ye, Xiangying Wang, Fupei Huang and Yi Liu,Effect of driving frequency on growth and structure of silicon films deposited by radio-frequencyand very-high-frequencymagnetron sputtering,ECS J. Solid State Sci. Technol.3(5), Q74-Q78 (2014)

5、Yi Liu,Chao Ye,Haijie He, Xiangying Wang, Shuibing Ge and Fupei Huang, Plasma property of inductively coupled discharge and substrate bias co-assistedvery-high-frequency magnetron sputtering,Thin Solid Films579, 1-8 (2015)

6、Yisong He, Chao Ye, Xiangying Wang, Mingwei Gao, Jiaming Guo, Peifang Yang, Structural properties and preparation of Si-rich Si_1−xC_xthin films by radio-frequency magnetron sputtering,Appl. Surf. Sci.363, 477-482 (2016)

7、Yue Zhang, Chao Ye, Xiang-Ying Wang,Pei-Fang Yang, Jia-Min Guo and Su Zhang, Initial growth and microstructure feature of Ag films prepared by very-high-frequency magnetron sputtering,Chin. Phys. B26(9), 095206 (2017)

8、Xiyue Liu, Chao Ye , Xiangying Wang, Su Zhang, Min Zhu, and Amin Jiang, Plasma impedance characteristics of radio frequency and very high-frequency magnetron discharges,IEEE Trans. Plasma Sci.48(1), 99–103 (2020)

9、Weichen NI, Chao YE, Yiqing YU, Xiangying WANG, Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge,Plasma Sci. Technol., 24(2), 025506 (2022)

10、叶超编著,《低温等离子体诊断原理与技术》，北京：科学出版社（2021）